HAL-LP Plate
Plate diameter | Ø280x66H |
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Plate rotation | 30 r/min |
lapping load | 0.1Mpa(about 1kg/cm2) 0.1Mpa |
lapping time | 10min |
work | AITic(After grindeng SD8000 HAL) |
Work size | 70Lx1.2W 3 row bars |
Work rotation | 30 r/min |
x1,000 | x5,000 | surface roughness | |
10min | Ra:0.584 nm P-V:2.709 nm |
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600min | Ra:0.596 nm P-V:3.023 nm |
Plate diameter | Ø100x40H |
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Plate rotation | 80 r/min |
lapping load | 0.1Mpa 0.1Mpa |
lapping time | 15min |
Work | Glass(After WA #1,200 hand lapping) |
Work size | 25mmx25mm |
Work rotation | 30 r/min |
Optical Microscope | Before Lapping | After Lapping |
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x500 | ||
Surface roughness | Ra:0.50μm | Ra:0.010μm |